eeNews Europe says Samsung is expanding its ASML partnership and joining efforts to develop a 12-inch photomask platform, moving beyond the industry's long-used 6-inch format.
eeNews Europe reports that Samsung and ASML are expanding their partnership around High NA EUV chipmaking technology. Samsung aims to use it for high-volume DRAM memory production by 2028, which the companies say would be an industry first. Samsung is also joining efforts to develop a 12-inch photomask platform. The outlet says the larger format could improve factory productivity, reduce manufacturing costs and help address future chip-patterning challenges.
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eeNews Europe says Samsung is expanding its ASML partnership and joining efforts to develop a 12-inch photomask platform, moving beyond the industry's long-used 6-inch format.
eeNews Europe reports that Samsung and ASML are expanding their partnership around High NA EUV chipmaking technology. Samsung aims to use it for high-volume DRAM memory production by 2028, which the companies say would be an industry first. Samsung is also joining efforts to develop a 12-inch photomask platform. The outlet says the larger format could improve factory productivity, reduce manufacturing costs and help address future chip-patterning challenges.
eeNews Europe@eeNewsEuropeThe next generation of DRAM could bring a major change to semiconductor manufacturing. 🔬 Samsung and ASML are expanding their partnership around High NA EUV, with Samsung targeting the technology for high-volume DRAM production by 2028, which the companies say would be an…
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eeNews Europe@eeNewsEuropeThe next generation of DRAM could bring a major change to semiconductor manufacturing. 🔬 Samsung and ASML are expanding their partnership around High NA EUV, with Samsung targeting the technology for high-volume DRAM production by 2028, which the companies say would be an…
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