SK HYNIX SELECTS TOKYO ELECTRON EQUIPMENT FOR 375-LAYER NAND DEPOSITION
SK HYNIX SELECTS TOKYO ELECTRON EQUIPMENT FOR 375-LAYER NAND DEPOSITION
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"The key change is the adoption of molybdenum (Mo). Part of the tungsten (W) film used previously has been replaced with molybdenum. NAND increases capacity by vertically stacking hundreds of layers of charge-storing cells and the word lines that control them. At 375 layers, SK Hynix decided to switch part of the word line material — the metal gate electrodes controlling each cell layer — from tungsten to molybdenum."

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Super high-aspect-ratio hole etching (Lam's domain) is always the spotlight, but the physical warpage control of depositing uniform Oxide/Nitride pairs across hundreds of layers under high vacuum is becoming the ultimate thermodynamic bottleneck for 375-layer 3D-NAND.
@jukan05 Do you think SK Hynix’s selection of TEL over competing ALD/CVD vendors reflects a fundamental shift toward superior stress/thermal governance over raw throughput in this micro-scaling era?

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SK HYNIX SELECTS TOKYO ELECTRON EQUIPMENT FOR 375-LAYER NAND DEPOSITION