9h ago

Hardware analyst Zephyr says a Huawei roadmap shows reliance on domestic EUV lithography to reach sub-2nm nodes by 2030

The roadmap aligns with Huawei's Project Mount Everest initiative

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Original post
OPZephyr#1497Zephyr@ZEPHYR_Z9

A lot of people seem to think that Huawei has side-stepped EUV and developed a method to scale to 1.4nm without it But as u can see from their graph, a huge density & clock speed jump happens between 2030 & 2031 After the 2019 sanctions, Huawei started project Mount Everest in 2020 The goal was to develop and mass-produce EUV machines within 10 years The tentative date of China's EUV is 2030 rn

11:01 PM · May 24, 2026 View on X
REPLYTeortaxes▶️ (DeepSeek 推特🐋铁粉 2023 – ∞)#420Teortaxes▶️ (DeepSeek 推特🐋铁粉 2023 – ∞)@TEORTAXESTEX

@zephyr_z9 Is the 250ish Mtr about stacking 2 chips?

ZephyrZephyr@zephyr_z9

A lot of people seem to think that Huawei has side-stepped EUV and developed a method to scale to 1.4nm without it But as u can see from their graph, a huge density & clock speed jump happens between 2030 & 2031 After the 2019 sanctions, Huawei started project Mount Everest in 2020 The goal was to develop and mass-produce EUV machines within 10 years The tentative date of China's EUV is 2030 rn

6:01 AM · May 25, 2026 · 93.9K Views
6:08 AM · May 25, 2026 · 4.9K Views